INTERNATIONAL
|
SOLVNET
Home
Tools
Manufacturing
Videos
Videos
SPIE Advanced Lithography 2008:
Immersion at 32nm and 22nm, but EUV makes headway as NIL comes on strong.
J Tracy Weed, Synopsys
PHOTOMASK JAPAN
Visit Synopsys Manufacturing at Photomask Japan, Apr 13-15
Contact us
News
NVIDIA Adopts Synopsys Yield Explorer to Reduce Time to Volume
Synopsys Announces Yield Explorer – Design-Centric Yield Management for Product....
Synopsys Unveils Proteus Pipeline Technology, Delivering a New Level of Performance
Synopsys Customers Accelerate Yield Learning With Converged Test and Yield....
Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
Voltaire and Synopsys Introduce High-Performance Compute Solution to Reduce....
Synopsys and Hitachi High-Technologies Deliver Enhanced OPC Modeling Speed,....
More
All Synopsys News
Articles
NVIDIA licenses Synopsys' yield management tool
EDN: Design-centric yield management
EDN: Synopsys tries to organize its efforts in EDA multiprocessing
SCDsource: Synopsys pledges multicore support for EDA applications
Semiconductor International: Nikon and Synopsys deliver on Advanced OPC promise
Chip Design: EDA Is Stepping Up to Meet New DFM Demands
A New Approach to Higher Yielding Silicon
More
White Papers
When Following the Rules Is Not Quite Sufficient: The Need for New Post Route Analysis Techniques
Optimizing Storage and I/O for Distributed Processing on Enterprise & High Performance Compute (HPC) Systems for Mask Data Preparation Software (CATS)
SPIE Advanced Lithography 2007 Papers
More
Technical Papers
High-Performance Compute Systems for MDP
More
Events
Photomask Japan
SEMICON West 2010
SPIE Photomask Technology
More
Videos
SPIE Advanced Lithography 2008:
More
SVP Cafe
SNUG
TCAD
© 2010 Synopsys, Inc. All Rights Reserved.
Contact us
|
Locations
|
Privacy
|
Legal
|
RSS