| Jan 03, 2012 | Leading Memory Manufacturer Endorses Proteus LRC for Lithography Verification
Post-OPC Verification Tool Provides Highest Accuracy and Lowest Cost of Ownership
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| Mar 01, 2011 | Synopsys Introduces Proteus LRC for Lithography Verification
Proteus LRC provides comprehensive, process-window-aware checking features to identify locations in a design that are sensitive to process variations, thereby enabling corrective action to be taken prior to committing a design to manufacture.
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| Oct 28, 2010 | Carl Zeiss and Synopsys Collaborate on In-Die Registration Metrology for Photomask Manufacturing
Carl Zeiss and Synopsys announce a collaboration to support the ZEISS tool family for in-die metrology solutions for the 32-nanometer (nm) technology node and below.
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| Jul 13, 2010 | SVTC Technologies Selects Synopsys' Manufacturing Tools to Accelerate Time to Commercialization
SVTC Technologies has chosen Synopsys' manufacturing tool suite to enable its customers to reduce time-to-market for a wide variety of innovative products using CMOS processes, MEMS, photovoltaics and other related nanotechnologies.
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| Mar 23, 2010 | Renesas Technology Has Adopted Synopsys Proteus OPC for 28-nm Development
The 28-nm node pushes the limits for single-exposure photon-based lithography, and by selecting Proteus, Renesas can achieve their aggressive OPC accuracy specifications with improvement of process robustness.
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| Oct 28, 2009 | NVIDIA Adopts Synopsys Yield Explorer to Reduce Time to Volume
Design-centric yield management enables product engineers to achieve rapid yield ramp and provide cost-effective yield control in volume production
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| Mar 16, 2009 | Synopsys Announces Yield Explorer – Design-Centric Yield Management for Product Engineering Teams
Yield Explorer Demonstrates 10x Faster Volume Diagnostics Analysis with a Single Data-Bank for Design, Fab and Test Data to Identify the Source of Yield Loss
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| Feb 26, 2008 | Synopsys Unveils Proteus Pipeline Technology, Delivering a New Level of Performance
Synopsys Inc. today announced the capability to pipeline key manufacturing applications. The new pipeline technology delivers reduction in design-to-mask cycle time.
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| Oct 23, 2007 | Synopsys Customers Accelerate Yield Learning With Converged Test and Yield Management Data Flow
Synopsys, Inc. today announced general availability of the Odyssey Design-for-Test (DFT) module for use by design organizations worldwide.
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| Sep 18, 2007 | Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
Embedded Scanner Parameter Module Delivers Improved OPC Accuracy, Enhanced Model Predictability and Reduced Time to Silicon for Mutual Customers
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| Sep 11, 2007 | Voltaire and Synopsys Introduce High-Performance Compute Solution to Reduce Cycle Time for Semiconductor Mask Manufacturing
Voltaire Ltd. today announced they are developing a high-performance compute (HPC) cluster solution for semiconductor mask data-preparation (MDP) applications.
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| Jun 12, 2007 | Synopsys and Hitachi High-Technologies Deliver Enhanced OPC Modeling Speed, Accuracy and Predictability
Synopsys, Inc. today announced that they have developed a seamless link between Hitachi High-Tech's DesignGauge design data measuring system and Synopsys' Proteus optical proximity correction (OPC) solution.
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| Feb 27, 2007 | Synopsys Proteus OPC Delivers Superior Cost of Ownership on Intel® Core™ Microarchitecture
Optimized x86-64 Hardware Offers Superior Price/Performance for OPC Compared to Custom Hardware Platforms
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