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All Synopsys News

Oct 28, 2009NVIDIA Adopts Synopsys Yield Explorer to Reduce Time to Volume
Design-centric yield management enables product engineers to achieve rapid yield ramp and provide cost-effective yield control in volume production

Mar 16, 2009Synopsys Announces Yield Explorer – Design-Centric Yield Management for Product Engineering Teams
Yield Explorer Demonstrates 10x Faster Volume Diagnostics Analysis with a Single Data-Bank for Design, Fab and Test Data to Identify the Source of Yield Loss

Feb 26, 2008Synopsys Unveils Proteus Pipeline Technology, Delivering a New Level of Performance
Synopsys Inc. today announced the capability to pipeline key manufacturing applications. The new pipeline technology delivers reduction in design-to-mask cycle time.

Oct 23, 2007Synopsys Customers Accelerate Yield Learning With Converged Test and Yield Management Data Flow
Synopsys, Inc. today announced general availability of the Odyssey Design-for-Test (DFT) module for use by design organizations worldwide.

Sep 18, 2007Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
Embedded Scanner Parameter Module Delivers Improved OPC Accuracy, Enhanced Model Predictability and Reduced Time to Silicon for Mutual Customers

Sep 11, 2007Voltaire and Synopsys Introduce High-Performance Compute Solution to Reduce Cycle Time for Semiconductor Mask Manufacturing
Voltaire Ltd. today announced they are developing a high-performance compute (HPC) cluster solution for semiconductor mask data-preparation (MDP) applications.

Jun 12, 2007Synopsys and Hitachi High-Technologies Deliver Enhanced OPC Modeling Speed, Accuracy and Predictability
Synopsys, Inc. today announced that they have developed a seamless link between Hitachi High-Tech's DesignGauge design data measuring system and Synopsys' Proteus optical proximity correction (OPC) solution.

Feb 27, 2007Synopsys Proteus OPC Delivers Superior Cost of Ownership on Intel® Core™ Microarchitecture
Optimized x86-64 Hardware Offers Superior Price/Performance for OPC Compared to Custom Hardware Platforms

Jul 24, 2006Synopsys Extends DFM Leadership with Launch of PrimeYield Tool Suite for Yield Analysis
Integration of Production-Proven Design and Manufacturing Technology Accelerates Time to Yield

Jul 24, 2006Synopsys PrimeYield LCC Links to IC Compiler for Automated Correction of Lithography Problems
Toshiba to Deploy Integrated, Production-Proven DFM Technology into Standard Layout Flow

Dec 19, 2005Synopsys’ PSM Technology Adopted by NEC Electronics for 65-nm Production and Beyond
PSM Technology Enhances Lithography Resolution and Yield for High-Performance Products

Oct 04, 2005SEMATECH and Synopsys to Develop Advanced OPC Models for 45-Nanometer
Accurate OPC Modeling Critical for Accelerating Time to Yield

May 24, 2005Synopsys i-Virtual Stepper System for Photomask Qualification Implemented by UMC
i-Virtual Stepper System Integrates Lithography Simulation and Automation to Deliver Improved Mask Turn-Around Time and Yield.

Mar 01, 2005Grace Semiconductor Manufacturing Standardizes on Synopsys' DFM Tool Suite
Synopsys' Distributed Processing and Scalable Architecture Improve Time to Yield While Maintaining Accuracy