White Papers 

When Following the Rules Is Not Quite Sufficient: The Need for New Post Route Analysis Techniques
Smaller technologies, shorter time to market windows and more complex designs are driving the need for an additional set of analysis techniques which will help designers understand how susceptible their designs are to manufacturing process variations.
Kuo H. Wu, PhD Marilyn Adan

Optimizing Storage and I/O for Distributed Processing on Enterprise & High Performance Compute (HPC) Systems for Mask Data Preparation Software (CATS)
Semiconductor, or chip, manufacturing represents one of the most complex manufacturing processes in the world.
Glenn Newell, Sr. IT Solutions Mgr, Naji Bekhazi, Director of R&D, Mask Data Prep (CATS) Ray Morgan, Sr. Product Marketing Manager, Mask Data Prep (CATS)

SPIE Advanced Lithography 2007 Papers
These papers were published in the SPIE Advanced Lithography proceedings and are made available as an electronic reprint (preprint) with permission of SPIE.
Synopsys