CATS® is a highly scalable and flexible software application that transcribes complex design data into machine readable instructions for e-beam and laser machines used for the pattern generation and manufacturing of IC, MEMS, TFT-LCD, TFH, photonics, and biochip products. CATS has installations in virtually every photomask manufacturing facility worldwide, and is the de facto standard for mask manufacturing, inspection, metrology, and direct-write-on-wafer.
CATS the MDP Standard | Applications |
| Basic and Advanced Fracture | CATS fracturing addresses challenges associated with different mask writers and inspections tools. |
| Proximity Effect Correction | CATS provides correction of E-beam and Optical Proximity Effects |
| Jobdeck Operations | Powerful and highly interactive mask and pattern support |
| Manufacturing Rule Check | CATS is the only available software package to support e-beam and laser exposure tools, as well as all major inspection tools. |
| Lithography Output Options | Comprehensive data prep solutions for mask and direct write |
| Metrology Marking | Using jobdeck information and electron beam pattern file data, CATS Metrology Marking option provides a unique graphical and command-driven environment. |
| Inspection Data Prep | CATS is the only commercially available software package to support both a wide variety of electron beam exposure tools and all major photomask inspection tools. |
| Distributed Processing | CATS delivers highly scalable and cost-effective MDP |